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EPITAXIAL GROWTH


Implant / Epitaxial Growth Process Engineer - Entry level

CareerJet.com

Maxim Integrated - Beaverton, OR - , personal growth, and community involvement. Want to make a difference and be challenged every day? Join us

9/20/2019

Solid State Technician

CareerJet.com

Northrop Grumman - Baltimore, MD - , epitaxial growth, diffusion and metallization to determine quality of process to locate defects. Determine

10/19/2019

Product Engineer Manufacturing LED Chips

CareerJet.com

Cree - Durham, NC - Job description: The primary focus of this position is to drive product quality, yield, cost, performance, and customer

9/13/2019

Laser Engineer IV

CareerJet.com

DRS Technologies - Madison, WI - designing and fabricating semiconductor laser devices. The incumbent will combine knowledge of semiconductor

7/24/2019

Sr. Intergration Engineer- Process Engineering

CareerJet.com

II-VI Incorporated - Sherman, TX - Sunnyvale, CA - with minimum of five years of experience in the areas of semiconductor product engineering,

10/20/2019

Characterization and Process Technician D shift

CareerJet.com

II-VI Incorporated - USA - of wafers coming into Epi for regrowth. Perform microscope inspection of epi defects and particle counts of wafers

10/20/2019

semiconductor device

Fuji Electric Co., Ltd.

On a front surface of an n+-type SiC substrate becoming a drain region, an n--type drift layer, a p-type base layer, and an n+-type source layer

10/21/2019

semiconductor device

Fuji Electric Co., Ltd.

On a front surface of an n+-type SiC substrate becoming a drain region, an n--type drift layer, a p-type base layer, and an n+-type source layer

10/21/2019

semiconductor device

Fuji Electric Co., Ltd.

On a front surface of an n+-type SiC substrate becoming a drain region, an n--type drift layer, a p-type base layer, and an n+-type source layer

10/21/2019

semiconductor device

Fuji Electric Co., Ltd.

On a front surface of an n+-type SiC substrate becoming a drain region, an n--type drift layer, a p-type base layer, and an n+-type source layer

10/21/2019

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Increasing capacity for water-related climate adaptation: Identifying

Climate

Increasing capacity for water-related climate adaptation: Identifying

Managing our water: Examples from the 2019 Dorset field trip

Wastewater

Managing our water: Examples from the 2019 Dorset field trip

Finding success on the road to Industry 4.0

Internet of Things

Finding success on the road to Industry 4.0

North Korean ballistic missile tests are very standard. Say WHAT?

Planning

North Korean ballistic missile tests are very standard. Say WHAT?

Don’t be surprised when South Korea wants nuclear weapons

Nuclear Power

Don’t be surprised when South Korea wants nuclear weapons

Power supply conceptual schemes for small medium-sized and large industrial

Energy

Power supply conceptual schemes for small medium-sized and large industrial